Hong-Dyi Chang

Title: Innovations of Hong-Dyi Chang

Introduction

Hong-Dyi Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor devices, holding a total of six patents. His work focuses on innovative methods that enhance the functionality and reliability of semiconductor technologies.

Latest Patents

One of his latest patents is a method for protecting a gate structure during contact formation. This patent discloses various semiconductor devices, including an exemplary device that features a substrate and a gate structure. The gate structure comprises a source region and a drain region, with a first etch stop layer positioned over the gate structure and a second etch stop layer over the source and drain regions. Additionally, a dielectric layer is placed over the substrate, along with gate, source, and drain contacts. The design ensures that the gate contact extends through the dielectric layer and the first etch stop layer to the gate structure, while the source and drain contacts extend through the dielectric layer and the second etch stop layer to their respective regions.

Career Highlights

Hong-Dyi Chang has worked with notable companies, including Taiwan Semiconductor Manufacturing Company Limited. His experience in the semiconductor industry has allowed him to develop innovative solutions that address complex challenges in device fabrication.

Collaborations

Throughout his career, he has collaborated with esteemed colleagues such as Kong-Beng Thei and Pei-Chao Su. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a culture of innovation.

Conclusion

Hong-Dyi Chang's contributions to the field of semiconductor devices through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced technologies in semiconductor manufacturing.