Annaka, Japan

Hitoshi Habuka


Average Co-Inventor Count = 2.0

ph-index = 9

Forward Citations = 1,013(Granted Patents)


Location History:

  • Maebashi, JP (1991 - 1999)
  • Gunma-ken, JP (1997 - 2001)
  • Annaka, JP (1999 - 2003)

Company Filing History:


Years Active: 1991-2003

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26 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Hitoshi Habuka in Silicon Technology

Introduction: Hitoshi Habuka, an influential inventor from Annaka, Japan, holds an impressive portfolio of 26 patents. His contributions have significantly impacted the field of silicon technology, particularly in the fabrication of epitaxial wafers and thin films.

Latest Patents: Among his latest innovations is a patent for a silicon epitaxial wafer and the production method thereof. This invention addresses the issue of surface roughness distribution in silicon epitaxial wafers by optimizing the temperature distribution on the surface of a susceptor used in vapor phase thin film growth apparatus. The ingenious design of the susceptor supports only the peripheral portion of its rear surface, utilizing vertical pins at the ends of spokes that extend from a rotary shaft. This innovation allows for maintaining the temperature difference across the silicon wafer to 7°C or less, effectively reducing surface roughness distribution to 0.02 ppm. Another noteworthy invention is a method for fabricating silicon thin films, showcasing his expertise and dedication to advancing silicon technologies.

Career Highlights: Hitoshi Habuka has worked with renowned companies, including Shin-Etsu Handotai Co., Ltd., and Shin-Etsu Handotai, Ltd. His tenure at these companies has been marked by a commitment to research and development, leading to groundbreaking advancements in semiconductor materials and processes.

Collaborations: Throughout his career, Habuka has collaborated with esteemed colleagues, including Masanori Mayuzumi and Toru Otsuka. Together, they have conducted pivotal research and development projects that have contributed to the progress in silicon technology.

Conclusion: Hitoshi Habuka's innovative work and substantial patent contributions have played a crucial role in the advancement of silicon technology. His dedication to optimizing fabrication methods continues to influence the semiconductor industry and paves the way for future innovations.

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