The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Mar. 15, 1999
Hitoshi Habuka, Annaka, JP;
Toru Otsuka, Annaka, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Abstract
This invention provides a method of manufacturing a wafer heating furnace having a desired heating distribution with less trials and errors by predicting heating distributions in the process of designing the heating furnace. In manufacturing a heating furnace for use of wafer heating having a light source and a lamp house surrounding the light source, on a presumption that a light flux emitted from the light source is mirror reflected by a wall surface of the lamp house while the light flux is mirror reflected also by a surface of a wafer, a path of the light flux attributable to the reflection on the wall surface of the lamp house as well as the reflection on the surface of the wafer is traced, a calculation of converting an absorption of the light flux occurring together with the reflection at least on the surface of the wafer into thermal energy is performed with respect to a plurality of light fluxes emitted from the light source to thereby arithmetically determine heating distributions on the wafer, and based on results of the calculation, a structure of the light source and the lamp house is determined.