Toru Otsuka

Title: The Innovative Contributions of Toru Otsuka

Introduction

Toru Otsuka is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of vapor deposition technology, holding a total of 9 patents. His work has advanced the manufacturing processes of silicon epitaxial layers, which are crucial in the semiconductor industry.

Latest Patents

Otsuka's latest patents include a vapor deposition apparatus and a vapor deposition method. The vapor phase growth apparatus is designed to perform the growth of a silicon epitaxial layer on a silicon single crystal substrate while heating it from both sides. The apparatus features a pocket that supports the substrate's rear surface, with a unique warped inverted U-shaped longitudinal sectional shape. Additionally, his method for manufacturing silicon epitaxial wafers involves a vapor phase growth process, where a silicon deposit is removed by etching the reaction chamber with hydrogen chloride gas, followed by a cooling process before the growth is performed.

Career Highlights

Toru Otsuka is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor materials industry. His innovative work has positioned him as a key figure in the development of advanced manufacturing techniques for silicon wafers.

Collaborations

Otsuka has collaborated with notable coworkers, including Hitoshi Habuka and Shoji Akiyama. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Toru Otsuka's contributions to vapor deposition technology and silicon epitaxial layer manufacturing have made a significant impact in the semiconductor field. His innovative patents and collaborations continue to influence advancements in this critical industry.