Location History:
- Tokyo, JP (1997 - 2003)
- Kanagawa, JP (2010)
Company Filing History:
Years Active: 1997-2010
Title: Hitoshi Abiko: Innovator in Semiconductor Technology
Introduction
Hitoshi Abiko is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His innovative work has paved the way for advancements in imaging devices and semiconductor devices.
Latest Patents
Among his latest patents, Hitoshi Abiko has developed a semiconductor device that features a lower electrode projecting outward from a common end face of an upper electrode and a capacitor film. A protective film, made of a different material from the capacitor film, is deposited on top of a part of the lower electrode outside the end face. This protective film extends inward from the end face, creating a stepped surface near the end face that suppresses damage during etching of the upper electrode and capacitor film. Additionally, the protective film prevents damage in the lower electrode. Another notable invention is a backside imaging device that includes a bump overlapping with a sensor array region or photodiode. This configuration serves as a support, preventing damage to the semiconductor substrate due to bending.
Career Highlights
Hitoshi Abiko has worked with notable companies such as NEC Corporation and NEC Electronics Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Hitoshi has collaborated with esteemed colleagues, including Minoru Higuchi and Isami Sakai, further enhancing his contributions to the field.
Conclusion
Hitoshi Abiko's work in semiconductor technology exemplifies innovation and dedication. His patents reflect a commitment to advancing technology and improving device performance.