The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1997
Filed:
Oct. 30, 1996
Hitoshi Abiko, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A semiconductor device having a CMOS structure having a low resistivity silicide layer in a source/drain region is fabricated. To realize silicide formation for resistivity reduction of the n-type source/drain region, an impurity-free silicon layer is formed thereon before forming a high melting point metal silicide layer. For the n-type source/drain region, ion implantation is made through the silicon layer. It is thus possible to obtain a shallow junction of the p-type source/drain region, prevent ion implantation time increase and obtain quick fabrication without reducing the ion implantation energy.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile