Koshi, Japan

Hiroyuki Masutomi


Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kumamoto, JP (2019)
  • Koshi, JP (2022 - 2024)

Company Filing History:


Years Active: 2019-2024

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5 patents (USPTO):Explore Patents

Title: **Hiroyuki Masutomi: Innovator in Substrate Processing Technology**

Introduction

Hiroyuki Masutomi, based in Koshi, Japan, is a notable inventor with a portfolio of five patents. His work primarily focuses on advancements in substrate processing apparatuses and methods, showcasing his dedication to innovation in technology.

Latest Patents

Masutomi's latest patents include the innovative "Substrate Processing Apparatus and Substrate Processing Method." This technology features a processing tub designed for etching processes by immersing multiple substrates in a liquid. The apparatus includes two groups of discharge openings that efficiently manage the flow of processing liquid. Additionally, the patent includes a controller that adjusts the flow rates dynamically during the etching process.

Another significant patent is the "Substrate Liquid Processing Apparatus." This apparatus features an inner tub that stores processing liquid and an outer tub, with dual cover bodies that can both close and open different regions of the top opening. This innovative design enhances the efficiency of substrate processing while maintaining a controlled environment.

Career Highlights

Hiroyuki Masutomi is associated with Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. His contributions to the field have significantly impacted the efficiency and effectiveness of substrate processing technologies. Through his inventive spirit, he continues to bring new solutions to the industry.

Collaborations

Throughout his career, Masutomi has worked alongside talented colleagues, including Koji Tanaka and Toshiyuki Shiokawa. These collaborations have played an essential role in developing innovative technologies and driving forward the advancements in substrate processing.

Conclusion

Hiroyuki Masutomi stands out as a key innovator in the field of substrate processing technology. With his impressive record of patents and continuous collaboration with industry peers, he has made substantial contributions that enhance the efficiency of semiconductor manufacturing processes. As technology evolves, Masutomi's innovations will undoubtedly play a critical role in shaping the future of the industry.

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