The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
Sep. 07, 2018
Tokyo Electron Limited, Tokyo, JP;
Takafumi Tsuchiya, Koshi, JP;
Yuki Ishii, Koshi, JP;
Hiroyuki Masutomi, Koshi, JP;
Seigo Fujitsu, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate liquid processing apparatus Aincludes a processing tubaccommodating a processing liquidand a substrate; a gas nozzledischarging a gas into a lower portion within the processing tub; a gas supply unitsupplying the gas; a gas supply lineconnecting the gas nozzlewith the gas supply unit; a decompression unitintroducing the processing liquidwithin the processing tubinto the gas supply lineby decompressing the gas supply line; and a control unitperforming a first control of controlling the gas supply unitto stop supply of the gas and controlling the decompression unitto introduce the processing liquidinto the gas supply linein a part of an idle period during which the substrateis not accommodated in the processing tub