Hirotaka Kurimoto

Title: Hirotaka Kurimoto: Innovator in Semiconductor Technology

Introduction

Hirotaka Kurimoto is a prominent inventor based in Jyoetsu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods for manufacturing epitaxial wafers, which are crucial for various electronic applications.

Latest Patents

Kurimoto's latest patents include innovative methods for producing semiconductor epitaxial wafers. One notable patent describes a method of manufacturing an epitaxial wafer that includes epitaxially growing a semiconductor layer on a silicon-based substrate. This method involves applying terrace processing to the outer peripheral portion of the substrate, resulting in an epitaxial wafer that is completely free from cracks. Another patent outlines a method for producing a semiconductor epitaxial wafer, which includes observing the outer edge portion of the fabricated wafer and removing any portions where cracks or peeling are present. This ensures the production of a completely crack-free semiconductor epitaxial wafer.

Career Highlights

Hirotaka Kurimoto is associated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work has been instrumental in advancing the manufacturing processes of semiconductor materials, contributing to the overall efficiency and reliability of electronic devices.

Collaborations

Kurimoto has collaborated with notable colleagues such as Kazunori Hagimoto and Masaru Shinomiya. These partnerships have fostered innovation and have played a significant role in the development of new technologies in the semiconductor field.

Conclusion

Hirotaka Kurimoto's contributions to semiconductor technology through his patents and collaborations highlight his importance in the industry. His innovative methods for manufacturing epitaxial wafers are paving the way for advancements in electronic applications.