Miyagi, Japan

Hiroshi Nagahata

This inventor holds 8 USPTO granted patents and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2011-2025.

USPTO Granted Patents = 8 

% Patents Active = 87.5

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Nirasaki, JP (2011)
  • Miyagi, JP (2016 - 2023)

Company Filing History:


Years Active: 2011-2025

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8 patents (USPTO):Explore Patents

Title: Hiroshi Nagahata: Innovator in Substrate Processing Technology

Introduction

Hiroshi Nagahata is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 8 patents. His work focuses on improving the efficiency and accuracy of substrate processing methods, which are crucial in various manufacturing processes.

Latest Patents

Hiroshi's latest patents include a substrate processing apparatus and a substrate transfer position adjustment method. This innovative apparatus features a process module with a stage that has a first surface for substrate placement and a second surface. It includes an edge ring, a measurement unit for etching rate assessment, and a controller that manages substrate transfer and etching processes. The controller calculates etching rates at various points on the substrate and generates approximate curves to optimize the processing method.

Another notable patent is a temperature estimation apparatus designed to enhance plasma processing systems. This apparatus utilizes a time series model to estimate temperature data by correlating process data with temperature measurements inside the processing space. This advancement allows for more precise control of processing conditions, leading to improved outcomes in substrate processing.

Career Highlights

Hiroshi Nagahata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in developing advanced technologies that enhance substrate processing capabilities.

Collaborations

Hiroshi collaborates with talented coworkers, including Ryota Sakane and Hideyuki Kobayashi. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited, fostering a collaborative environment that drives technological advancements.

Conclusion

Hiroshi Nagahata's contributions to substrate processing technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to improving manufacturing processes, making him a valuable asset in the field.

Profile summary based on public USPTO records.
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