The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Nov. 29, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ryota Sakane, Miyagi, JP;

Takashi Kitazawa, Miyagi, JP;

Hiroshi Nagahata, Miyagi, JP;

Hideyuki Kobayashi, Miyagi, JP;

Koji Yamagishi, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/505 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45557 (2013.01); C23C 16/401 (2013.01); C23C 16/45504 (2013.01); C23C 16/45536 (2013.01); C23C 16/45542 (2013.01); C23C 16/45544 (2013.01); C23C 16/505 (2013.01);
Abstract

A processing method includes a first process of exposing a first sensor to a processing space within a chamber and blocking a second sensor from the processing space within the chamber; a second process of supplying a first processing gas containing a precursor gas into the chamber; a third process of controlling a state within the chamber based on a measurement value of the first sensor; a fourth process of blocking the first sensor from the processing space within the chamber and exposing the second sensor to the processing space within the chamber; a fifth process of supplying a second processing gas containing a reactant gas into the chamber; and a sixth process of controlling the state within the chamber based on a measurement value of the second sensor. The first process to the six process are repeatedly performed multiple times.


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