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For the Inventor, By the Inventor

Kanagawa, Japan

Hiroshi Koizumi

This inventor holds 23 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Canon Denshi Kabushiki Kaisha, Canon Kabushiki Kaisha. Active years: 1990-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Koizumi. Retrieved from https://idiyas.com/inventor/hiroshi-koizumi-0hpb1829

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 65.2

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 89(Granted Patents)


Location History:

  • Hanno, JP (1990)
  • Hiratsuka, JP (2009 - 2015)
  • Kanagawa-ken, JP (2011 - 2016)

Company Filing History:

goldMedal21 out of 53,286 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal2 out of 318 
 
Canon Denshi Kabushiki Kaisha
 patents
bronzeMedal2 out of 93,136 
 
Canon Kabushiki Kaisha
 patents
where one patent can have more than one assignee

Years Active: 1990-2016

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Areas of Expertise:
Substrate Processing
Semiconductor Light Emitting Device
Optical Semiconductor Device
Pattern Transfer
Droplet Ejection
Luminous Material
Ink Jet Applicator
Coater
Stage Apparatus
Exposure Blade
Stepping Motor
23 patents (USPTO):Explore Patents
1. 9303976 - Substrate processing system and substrate processing program (2016-04-05),
2. 9188879 - Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method (2015-11-17),
3. 9099619 - Semiconductor light emitting device and method for manufacturing the same (2015-08-04),
4. 9041036 - Semiconductor light emitting device wherein a linear expansion coefficient of an intermediate layer is larger than a linear expansion coefficient of a first semiconductor layer and smaller than a linear expansion coefficient of a wavelength conversion layer (2015-05-26),
5. 9021983 - Stage apparatus and process apparatus (2015-05-05),
6. 8987762 - Semiconductor light-emitting device and manufacturing method of the same (2015-03-24),
7. 8981412 - Optical semiconductor device and method for manufacturing same (2015-03-17),
8. 8890199 - Semiconductor light emitting device and method for manufacturing the same (2014-11-18),
9. 8754429 - Optical semiconductor device and method for manufacturing same (2014-06-17),
10. 8535765 - Method of producing a low-molecular luminous material dispersant, an apparatus for producing a low-molecular luminous material dispersant and a low-molecular luminous material dispersant (2013-09-17),
11. 8490571 - Coater, method for manufacturing coated article, and fluid blowing unit (2013-07-23),
12. 8399275 - Method for manufacturing semiconductor light emitting device (2013-03-19),
13. 8368089 - Semiconductor light emitting device (2013-02-05),
14. 8297743 - Droplet ejection head and method of manufacturing coated body (2012-10-30),
15. 8136920 - Nozzle plate, method for manufacturing nozzle plate, droplet discharge head, and droplet discharge apparatus (2012-03-20),

Title: The Innovative Journey of Hiroshi Koizumi

Introduction: Hiroshi Koizumi, a talented inventor hailing from Kanagawa-ken, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Hiroshi Koizumi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise and creativity.

Career Highlights: With a career spanning over two decades, Hiroshi Koizumi has worked for leading tech companies in Japan, spearheading research and development projects that have led to the creation of cutting-edge products and solutions.

Collaborations: Throughout his career, Hiroshi Koizumi has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Hiroshi Koizumi's passion for pushing the boundaries of technology and his relentless pursuit of excellence continue to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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