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For the Inventor, By the Inventor

Miyagi, Japan

Hironari Sasagawa

This inventor holds 9 USPTO granted patents and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironari Sasagawa. Retrieved from https://idiyas.com/inventor/hironari-sasagawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9 

% Patents Active = 88.9

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal9 out of 10,918 
 
Tokyo Electron Limited
 patents

Years Active: 2021-2026

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9 patents (USPTO):Explore Patents
1. 12665176 - Etching processing apparatus, etching processing system, analysis apparatus, etching processing method, and storage medium (2026-06-23),
2. 12112954 - Etching method, substrate processing apparatus, and substrate processing system (2024-10-08),
3. 11961746 - Substrate processing method and substrate processing apparatus (2024-04-16),
4. 11862441 - Plasma processing method and plasma processing apparatus (2024-01-02),
5. 11810791 - Etching method, substrate processing apparatus, and substrate processing system (2023-11-07),
6. 11728166 - Substrate processing method and substrate processing apparatus (2023-08-15),
7. 11450537 - Substrate processing method and substrate processing apparatus (2022-09-20),
8. 11380555 - Etching method and etching apparatus (2022-07-05),
9. 10916420 - Processing method and plasma processing apparatus (2021-02-09),

Title: Hironari Sasagawa: Innovator in Substrate Processing Technologies

Introduction

Hironari Sasagawa is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 9 patents. His innovative approaches have advanced the technology used in etching methods and substrate processing systems.

Latest Patents

Sasagawa's latest patents include an etching method that involves forming a film on a substrate's surface, which has a region to be etched and a mask. The mask features an opening that partially exposes the region, and the film is made from the same material as the region. This method further includes the etching of the region. Another notable patent is a substrate processing method that consists of forming a recess on a workpiece by partially etching it. This method also includes forming a film with varying thickness along the depth direction of the recess, achieved through a two-step reactant process.

Career Highlights

Hironari Sasagawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that enhance substrate processing efficiency and precision.

Collaborations

Sasagawa has collaborated with notable colleagues, including Sho Kumakura and Maju Tomura. Their combined expertise has contributed to the successful development of innovative technologies in the field.

Conclusion

Hironari Sasagawa's contributions to substrate processing technologies have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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