Hirokatsu Yashiro

Title: Innovations of Hirokatsu Yashiro in Semiconductor Technology

Introduction

Hirokatsu Yashiro is a distinguished inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, evidenced by his impressive portfolio of 12 patents. His work primarily focuses on the enhancement of silicon carbide materials, crucial for developing advanced semiconductor devices.

Latest Patents

Yashiro's latest innovations include:

1. **Low resistivity single crystal silicon carbide wafer** - This invention provides a low resistivity silicon carbide single crystal wafer designed for fabricating semiconductor devices with exceptional characteristics. The wafer features a specific volume resistance of 0.001 Ωcm to 0.012 Ωcm, with 90% or more of the surface area comprising an SiC single crystal surface exhibiting a roughness (Ra) of 1.0 nm or less.

2. **Process for producing epitaxial silicon carbide single crystal substrate** - This patent discloses a unique method for producing an epitaxial single-crystal silicon carbide substrate. It involves epitaxially growing a silicon carbide film on a single-crystal silicon carbide substrate through chemical vapor deposition. The process includes a main crystal growth step and a secondary crystal growth step, allowing for the controlled variation of growth temperatures. This technique significantly inhibits the transfer of basal plane dislocations to the epitaxial film, yielding a high-quality product.

Career Highlights

Hirokatsu Yashiro has held pivotal roles in notable companies such as Nippon Steel Corporation and Nippon Steel & Sumitomo Metal Corporation. His work in these organizations has helped advance the understanding and application of semiconductor materials, positioning him as a key figure in the industry.

Collaborations

Throughout his career, Yashiro has collaborated with esteemed colleagues like Jiro Ohno and Tatsuo Fujimoto. Their joint efforts have contributed to advancements in semiconductor research and have fostered a collaborative environment conducive to innovation.

Conclusion

Hirokatsu Yashiro's contributions to semiconductor technology reflect a profound commitment to innovation within the field. His patents underscore his expertise in silicon carbide substrates and epitaxial growth processes, paving the way for future advancements in semiconductor devices. As an influential inventor, his work continues to inspire and shape the future of technology.