The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2018

Filed:

Dec. 01, 2009
Applicants:

Tatsuo Fujimoto, Tokyo, JP;

Noboru Ohtani, Tokyo, JP;

Masakazu Katsuno, Tokyo, JP;

Masashi Nakabayashi, Tokyo, JP;

Hirokatsu Yashiro, Tokyo, JP;

Inventors:

Tatsuo Fujimoto, Tokyo, JP;

Noboru Ohtani, Tokyo, JP;

Masakazu Katsuno, Tokyo, JP;

Masashi Nakabayashi, Tokyo, JP;

Hirokatsu Yashiro, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 5/00 (2006.01); C30B 29/36 (2006.01); C30B 23/00 (2006.01); C30B 25/02 (2006.01); C30B 29/40 (2006.01); C30B 33/02 (2006.01);
U.S. Cl.
CPC ...
C30B 29/36 (2013.01); C30B 23/00 (2013.01); C30B 25/02 (2013.01); C30B 29/403 (2013.01); C30B 33/02 (2013.01); Y10T 428/24355 (2015.01);
Abstract

The invention provides a low resistivity silicon carbide single crystal wafer for fabricating semiconductor devices having excellent characteristics. The low resistivity silicon carbide single crystal wafer has a specific volume resistance of 0.001 Ωcm to 0.012 Ωcm and 90% or greater of the entire wafer surface area is covered by an SiC single crystal surface of a roughness (Ra) of 1.0 nm or less.


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