Nara, Japan

Hikaru Nishitani


Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 120(Granted Patents)


Location History:

  • Hyogo, JP (2014 - 2015)
  • Nara, JP (2003 - 2016)

Company Filing History:


Years Active: 2003-2016

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9 patents (USPTO):Explore Patents

Title: Hikaru Nishitani: Innovator in Semiconductor Technology

Introduction

Hikaru Nishitani is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on innovative methods for semiconductor thin-film formation and evaluation.

Latest Patents

Nishitani's latest patents include a semiconductor thin-film forming method, which involves creating an amorphous silicon film with specific photoluminescence characteristics. This method is crucial for the production of high-quality crystalline silicon films. Another notable patent is a crystallinity evaluation method that utilizes Raman spectrometry to assess the crystallinity of semiconductor films. This method involves generating waveforms through fitting techniques and extracting peak values to evaluate the film's quality.

Career Highlights

Throughout his career, Nishitani has worked with notable companies such as Matsushita Electric Industrial Co., Ltd. and Joled Inc. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.

Collaborations

Nishitani has collaborated with esteemed colleagues, including Takahiro Kawashima and Yoshinao Taketomi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Hikaru Nishitani's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing and evaluation methods.

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