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For the Inventor, By the Inventor

San Diego, CA, United States of America

Herve A Besaucele

This inventor holds 21 USPTO granted patents and 2 EPO patents, primarily in Gas Discharge Lasers. Top assignee: Cymer, Inc.. Active years: 1999-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Herve A Besaucele. Retrieved from https://idiyas.com/inventor/herve-a-besaucele

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21

% Patents Active = 76.2


Average Co-Inventor Count = 7.7

ph-index = 13

Forward Citations = 927(Granted Patents)


Location History:

  • La Jolla, CA (US) (2000)
  • San Diego, CA (US) (1999 - 2010)

Company Filing History:

goldMedal21 out of 542 
 
Cymer, Inc.
 patents

Years Active: 1999-2010

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Areas of Expertise:
Laser Gas Injection
Excimer Laser
Fluorine Injection
Beam Delivery
Parameter Control
High Rep-Rate
Narrow Band
Pulse Energy Control
Modular Design
Production Quality
Lithography Laser
Energy Sensor Feedback
21 patents (USPTO):Explore Patents
1. 7835414 - Laser gas injection system (2010-11-16),
2. 7741639 - Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control (2010-06-22),
3. 7567607 - Very narrow band, two chamber, high rep-rate gas discharge laser system (2009-07-28),
4. 7471708 - Gas discharge laser output light beam parameter control (2008-12-30),
5. 7218661 - [object Object] (2007-05-15),
6. 7061961 - Very narrow band, two chamber, high rep-rate gas discharge laser system (2006-06-13),
7. 7058107 - Line selected F2 two chamber laser system (2006-06-06),
8. 6985508 - Very narrow band, two chamber, high reprate gas discharge laser system (2006-01-10),
9. 6801560 - Line selected F2 two chamber laser system (2004-10-05),
10. 6704339 - Lithography laser with beam delivery and beam pointing control (2004-03-09),
11. 6625191 - Very narrow band, two chamber, high rep rate gas discharge laser system (2003-09-23),
12. 6567450 - Very narrow band, two chamber, high rep rate gas discharge laser system (2003-05-20),
13. 6553049 - ArF laser with low pulse energy and high rep rate (2003-04-22),
14. 6330261 - Reliable, modular, production quality narrow-band high rep rate ArF excimer laser (2001-12-11),
15. 6188710 - Narrow band gas discharge laser with gas additive (2001-02-13),

Title: Inventor Herve A Besaucele

Introduction: Herve A Besaucele is a renowned inventor based in San Diego, CA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Herve A Besaucele holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and creativity.

Career Highlights: With over two decades of experience in the industry, Herve A Besaucele has worked with leading tech companies to develop cutting-edge solutions that have revolutionized various sectors.

Collaborations: Throughout his career, Herve A Besaucele has collaborated with top researchers, engineers, and scientists to bring his ideas to life, fostering a culture of innovation and excellence.

Conclusion: Herve A Besaucele's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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