The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Apr. 25, 2007
Wayne J. Dunstan, San Diego, CA (US);
Kevin M. O'brien, San Diego, CA (US);
Robert N. Jacques, San Diego, CA (US);
Herve A. Besaucele, San Diego, CA (US);
Aravind Ratnam, San Diego, CA (US);
Wayne J. Dunstan, San Diego, CA (US);
Kevin M. O'Brien, San Diego, CA (US);
Robert N. Jacques, San Diego, CA (US);
Herve A. Besaucele, San Diego, CA (US);
Aravind Ratnam, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.