The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Feb. 01, 2006
David S. Knowles, San Diego, CA (US);
Daniel J. W. Brown, San Diego, CA (US);
Herve A. Besaucele, San Diego, CA (US);
David W. Myers, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Palash P. Das, Vista, CA (US);
Stuart L. Anderson, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Richard C. Ujazdowski, Poway, CA (US);
Eckehard D. Onkels, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Scot T. Smith, Winter Springs, FL (US);
William G. Hulburd, San Diego, CA (US);
Jeffrey Oicles, San Diego, CA (US);
David S. Knowles, San Diego, CA (US);
Daniel J. W. Brown, San Diego, CA (US);
Herve A. Besaucele, San Diego, CA (US);
David W. Myers, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Palash P. Das, Vista, CA (US);
Stuart L. Anderson, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Richard C. Ujazdowski, Poway, CA (US);
Eckehard D. Onkels, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Scot T. Smith, Winter Springs, FL (US);
William G. Hulburd, San Diego, CA (US);
Jeffrey Oicles, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.