Fremont, CA, United States of America

Henner Meinhold

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.9

ph-index = 9

Forward Citations = 593(Granted Patents)


Location History:

  • San Jose, CA (US) (2002 - 2004)
  • Fremont, CA (US) (2004 - 2020)

Company Filing History:


Years Active: 2002-2020

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14 patents (USPTO):Explore Patents

Title: Henner Meinhold: Innovator in Temperature Control Technology

Introduction

Henner Meinhold is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of temperature control technology, holding a total of 14 patents. His innovative designs have enhanced various industrial processes, particularly in chemical vapor deposition (CVD) chambers.

Latest Patents

One of Henner Meinhold's latest inventions is a temperature-controlled showerhead designed specifically for CVD chambers. This advanced showerhead improves heat dissipation, enabling precise temperature control through the use of an electric heater. The heat is effectively dissipated by conduction through the showerhead stem and fluid passageway, as well as radiation from a back plate. The temperature control system incorporates one or more of these showerheads within a CVD chamber, with fluid passageways serially connected to a heat exchanger.

Career Highlights

Henner Meinhold is currently employed at Novellus Systems Incorporated, where he continues to develop innovative solutions in the field of temperature control. His work has been instrumental in advancing the technology used in CVD processes, which are critical in various manufacturing applications.

Collaborations

Throughout his career, Henner has collaborated with notable colleagues, including Dan M Doble and Vince Wilson. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Henner Meinhold's contributions to temperature control technology have made a significant impact in the industry. His innovative patents and collaborative efforts continue to drive advancements in chemical vapor deposition processes.

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