This inventor holds 4 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Tokyo Electron Limited, Kao Corporation. Active years: 2022-2025.
Location History:
- Adachi-ku, JP (2022)
- Tokyo, JP (2023)
Company Filing History:
Years Active: 2022-2025
Title: Haruna Suzuki: Innovator in Etching Technology
Introduction
Haruna Suzuki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of etching technology, holding a total of 4 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing.
Latest Patents
One of his latest patents is an etching method and apparatus that involves providing a substrate containing silicon and a molybdenum or tungsten film. This method selectively etches the molybdenum or tungsten film relative to the silicon by using an oxidation gas and hexafluoride gas. Another notable patent focuses on preparing a substrate with titanium nitride and molybdenum or tungsten, where the titanium nitride is etched using a processing gas that includes ClF gas and N gas. This method ensures that the grain boundaries of the molybdenum or tungsten are nitrided to suppress pitting.
Career Highlights
Throughout his career, Haruna Suzuki has worked with notable companies such as Tokyo Electron Limited and Kao Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Haruna has collaborated with talented individuals, including Naoki Shindo and Gen You. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Haruna Suzuki's contributions to etching technology have positioned him as a key figure in the semiconductor field. His innovative patents and collaborations reflect his commitment to advancing technology and improving manufacturing processes.