Kanagawa, Japan

Haruki Nojo


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 64(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (2001)
  • Kanagawa-ken, JP (2000 - 2011)
  • Kanagawa, JP (2004 - 2017)

Company Filing History:


Years Active: 2000-2017

Loading Chart...
9 patents (USPTO):Explore Patents

Title: Haruki Nojo: Innovator in Semiconductor Polishing Technologies

Introduction

Haruki Nojo is a prominent inventor based in Kanagawa, Japan, known for his significant contributions to the field of semiconductor polishing technologies. With a total of nine patents to his name, Nojo has developed innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Nojo's latest patents is a chemical mechanical polishing composition and process. This invention aims to provide a polishing slurry composition that effectively reduces the occurrence of scratches during the polishing of semiconductor substrates. The method involves using a polishing slurry that contains metal oxide particles, water-soluble organic polymers, and water. This composition is designed to achieve a maximum polishing rate while minimizing scratches.

Another notable patent is related to periodic acid compositions for polishing ruthenium and low-K substrates. This method involves polishing a semiconductor substrate surface that has ruthenium features and dielectric materials. The aqueous composition used contains periodic acid, silica abrasive, and an amine to adjust the pH. The invention boasts a removal selectivity of ruthenium to low-K dielectric greater than 20:1, making the polishing process efficient and effective.

Career Highlights

Throughout his career, Haruki Nojo has worked with esteemed companies such as Toshiba Corporation and DuPont Air Products Nanomaterials, LLC. His experience in these organizations has contributed to his expertise in semiconductor technologies and polishing processes.

Collaborations

Nojo has collaborated with notable colleagues, including Rempei Nakata and Masako Kodera, who have also made significant contributions to the field of semiconductor manufacturing.

Conclusion

Haruki Nojo's innovative work in semiconductor polishing technologies has led to advancements that improve manufacturing processes. His patents reflect a commitment to enhancing efficiency and reducing defects in semiconductor substrates.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…