Shanghai, China

Hang Fan

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Shanghai, TW (2022 - 2023)
  • Shanghai, CN (2021 - 2024)

Company Filing History:


Years Active: 2021-2025

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10 patents (USPTO):Explore Patents

Title: Innovator Hang Fan: A Pioneer in Electrostatic Discharge Protection Technology

Introduction

Hang Fan is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor technology. With a total of six patents to his name, his innovative work primarily focuses on electrostatic discharge (ESD) protection solutions, showcasing his expertise and dedication to advancing the industry.

Latest Patents

Among Hang Fan's latest patents are two key innovations: the "Electrostatic Discharge Protection Circuit" and the "Device and Method for Electrostatic Discharge Protection."

The Electrostatic Discharge Protection Circuit is composed of an ESD protection circuit that connects two reference terminals. It incorporates two voltage dividers and both a first and second trigger circuit. The architecture ensures that the circuit efficiently handles potential ESD events, protecting sensitive semiconductor components.

The Device and Method for Electrostatic Discharge Protection features an ESD protection switch and an ESD driver, designed to manage input voltages effectively. The first trigger circuit within the driver activates the protection switch upon detecting overvoltage conditions, ensuring robust protection against ESD threats.

Career Highlights

Hang Fan has made significant strides within the semiconductor industry, having worked at esteemed companies such as Taiwan Semiconductor Manufacturing Company (TSMC) and TSMC China Company Limited. His tenure at these organizations not only honed his technical skills but also positioned him at the forefront of semiconductor innovation.

Collaborations

Throughout his career, Hang Fan has collaborated with talented professionals such as Ming-Fang Lai and Liang-Yu Su. Their joint efforts reflect a collective drive towards achieving breakthroughs in ESD protection technology, further enhancing the reliability of electronic devices against ESD failure.

Conclusion

Hang Fan continues to be an influential figure in the realm of semiconductor technology. His innovative electrical protection solutions are paving the way for safer and more reliable electronic components. With his ongoing dedication to research and development, Hang Fan's work stands as a testament to the importance of innovation in meeting the evolving demands of the technology landscape.

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