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For the Inventor, By the Inventor

Acton, MA, United States of America

Hailing Wang

USPTO Granted Patents = 26 

 

Average Co-Inventor Count = 5.1

ph-index = 4

Forward Citations = 27(Granted Patents)


Company Filing History:

goldMedal26 out of 2,615 
 
Skyworks Solutions, Inc.
 patents

Years Active: 2018-2025

where 'Filed Patents' based on already Granted Patents

26 patents (USPTO):
1. 12489036 - Field-effect transistors with interleaved finger configuration (2025-12-02),
2. 12273100 - Main-auxiliary field-effect transistor configurations (2025-04-08),
3. 11996832 - Main-auxiliary field-effect transistor configurations (2024-05-28),
4. 11842947 - Fabricating field-effect transistors with interleaved source and drain finger configuration (2023-12-12),
5. 11742408 - Cascode amplifier optimization (2023-08-29),
6. 11677395 - Switches with main-auxiliary field-effect transistor configurations (2023-06-13),
7. 11418185 - Switches with main-auxiliary field-effect transistor configurations (2022-08-16),
8. 11063586 - Main-auxiliary field-effect transistor configurations with an auxiliary stack and interior parallel transistors (2021-07-13),
9. 11049890 - Stacked field-effect transistors having proximity electrodes (2021-06-29),
10. 11004774 - Fabricating field-effect transistors with body contacts between source, gate and drain assemblies (2021-05-11),
11. 10886382 - Cascode amplifier optimization (2021-01-05),
12. 10862475 - Independently controlled main-auxiliary branch configurations for radio frequency applications (2020-12-08),
13. 10847445 - Non-symmetric body contacts for field-effect transistors (2020-11-24),
14. 10763847 - Main-auxiliary field-effect transistor configurations with interior parallel transistors (2020-09-01),
15. 10630283 - Segmented main-auxiliary branch configurations for radio frequency applications (2020-04-21),

Title: Hailing Wang: Innovator in Field-Effect Transistor Technology

Introduction

Hailing Wang, based in Acton, Massachusetts, is a prominent inventor recognized for his contributions to the field of electronics, particularly in field-effect transistor (FET) technology. With an impressive portfolio of 24 patents, Wang is at the forefront of innovations that enhance the performance of electronic devices.

Latest Patents

Among his latest patents, Wang has developed advanced configurations for switching or active FET devices. One notable invention details a branch design that integrates interior FETs of a main path in parallel with auxiliary FETs. This design includes a circuit assembly for a switching function that enables improved operability and efficiency. Furthermore, he has also disclosed a method for fabricating FET devices featuring interleaved source and drain finger configurations. This innovation optimizes device performance by enhancing the influence of voltages applied at the body contacts between the source, gate, and drain assemblies.

Career Highlights

Hailing Wang's expertise in semiconductor technology has led him to a rewarding career at Skyworks Solutions, Inc., a leader in radio frequency and analog semiconductor technologies. His innovative designs have not only received numerous patents but have also played critical roles in advancing the capabilities of electronic systems used in various applications.

Collaborations

Throughout his career, Wang has been privileged to collaborate with talented engineers and innovators, including his coworkers Dylan Charles Bartle and Paul T DiCarlo, contributing to a dynamic and creative work environment at Skyworks Solutions, Inc.

Conclusion

Hailing Wang exemplifies the spirit of innovation in the semiconductor industry. His extensive patent portfolio and collaborative efforts underscore his significant impact on FET technology. With continued advancements, Wang is sure to influence the future landscape of electronic devices.

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