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For the Inventor, By the Inventor

Fremont, CA, United States of America

Giang T Dao

This inventor holds 28 USPTO granted patents, primarily in Photolithography Techniques. Top assignee: Intel Corporation. Active years: 1994-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Giang T Dao. Retrieved from https://idiyas.com/inventor/giang-t-dao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28

% Patents Active = 67.9

Average Co-Inventor Count = 2.0

ph-index = 14

Forward Citations = 527(Granted Patents)


Location History:

  • Austin, TX (US) (2003 - 2004)
  • Fremont, CA (US) (1994 - 2008)

Company Filing History:

goldMedal28 out of 56,290 
 
Intel Corporation
 patents

Years Active: 1994-2008

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Areas of Expertise:
Photolithography
Phase-Shifting Mask
Contamination Control
Reticle Manufacturing
Mask Inspection
Electrostatic Discharge
Ultrafine Features
Patterning Method
Hinged Pellicles
Sub-Resolution Pattern
Device Layers
Opaquing Ring
28 patents (USPTO):Explore Patents
1. 7368020 - Reduced particle contamination manufacturing and packaging for reticles (2008-05-06),
2. 6793717 - Apparatus for keeping contamination away from a mask during exposure with light (2004-09-21),
3. 6763608 - Method of transporting a reticle (2004-07-20),
4. 6734443 - Apparatus and method for removing photomask contamination and controlling electrostatic discharge (2004-05-11),
5. 6732746 - Reduced particle contamination manufacturing and packaging for reticles (2004-05-11),
6. 6715495 - Reduced particle contamination manufacturing and packaging for reticles (2004-04-06),
7. 6660649 - In-situ balancing for phase-shifting mask (2003-12-09),
8. 6625800 - Method and apparatus for physical image based inspection system (2003-09-23),
9. 6611327 - Detection of contaminants on low wavelength masks (2003-08-26),
10. 6610123 - Filtered mask enclosure (2003-08-26),
11. 6569582 - Hinged pellicles and methods of use (2003-05-27),
12. 6548417 - In-situ balancing for phase-shifting mask (2003-04-15),
13. 6537706 - Method for making a photolithographic mask (2003-03-25),
14. 6279249 - Reduced particle contamination manufacturing and packaging for reticles (2001-08-28),
15. 5881125 - Attenuated phase-shifted reticle using sub-resolution pattern (1999-03-09),

Title: Innovations by Giang T. Dao in the Field of Manufacturing and Packaging

Introduction

Giang T. Dao, based in Fremont, California, stands as a prolific inventor in the realm of semiconductor manufacturing and packaging. With a remarkable portfolio of 28 patents, his contributions have significantly impacted the industry, particularly in the processes related to reticles and mask enclosures.

Latest Patents

Among his latest innovations, Giang has developed a method to reduce particle contamination in manufacturing and packaging for reticles. This method involves placing a reticle in a specially designed carrier that incorporates an ionizer. Additionally, the reticle can be attached to a pellicle, which consists of a frame and film, with the frame containing absorbent material to further mitigate contamination risks.

Another notable invention by Giang is an apparatus designed to keep contamination away from masks during light exposure. This invention includes a filtered mask enclosure with both exterior and interior regions, featuring a filtering region and a purging region. The innovative method focuses on removing various contaminants from purge gas and ensures a clean environment while exposing a wafer through the mask.

Career Highlights

Giang T. Dao currently contributes his expertise at Intel Corporation, one of the leading companies in technology and innovation. His work addresses critical challenges in the semiconductor industry, enhancing the reliability and efficiency of manufacturing processes. His inventions exemplify the intersection of creativity and technology, paving the way for advancements in electronic components.

Collaborations

Throughout his career, Giang has collaborated with esteemed colleagues, including Ronald J. Kuse and Nelson N. Tam. Together with his team, they have addressed complex problems in their field, showcasing the importance of teamwork and innovation in driving forward technological boundaries.

Conclusion

Giang T. Dao's impressive array of patents reflects his dedication to advancing semiconductor manufacturing techniques. His innovative solutions to contamination issues are vital for the industry's growth and success. As he continues to inspire fellow inventors and engineers, his contributions will undoubtedly shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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