The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2003
Filed:
Mar. 23, 2001
Applicant:
Inventors:
Arun Ramamoorthy, Sunnyvale, CA (US);
Giang Dao, Austin, TX (US);
Christopher Gerth, Santa Clara, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/188 ;
U.S. Cl.
CPC ...
G01N 2/188 ;
Abstract
Testing of a mask which is intended to be used for low wavelength lithography. At lower wavelengths, e.g., 157 nm, certain contaminants may become visible, even though they were transparent under visible or ultraviolet light. A combination of Raman spectroscopy and infrared absorption spectroscopy are used to identify the contaminants.