The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Sep. 25, 1992
Applicant:
Inventor:
Giang T Dao, Fremont, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; B05D / ;
U.S. Cl.
CPC ...
378 35 ; 2504922 ;
Abstract
An attenuated phase-shifted reticle. The disclosed reticle comprises a sub-resolution pattern, in regions other than the features to be formed. The sub-resolution pattern transmits a substantially uniform, attenuated radiation intensity. The features are phase-shifted relative to the sub-resolution pattern, such that light transmitted through them is approximately 180.degree. out of phase compared with the attenuated radiation transmitted through the sub-resolution pattern surrounding the features. In this way, the sub-resolution pattern acts as a phase-shifter for the features.