The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
Aug. 29, 2002
Giang Dao, Fremont, CA (US);
Qi-De Qian, Santa Clara, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
The present invention describes a method of forming a mask comprising: providing a substrate, the substrate having a first thickness; forming a balancing layer over the substrate, the balancing layer having a second thickness; forming an absorber layer over the balancing layer, the absorber layer having a first region separated from a second region by a third region; removing the absorber layer in the first region and the second region; removing the balancing layer in the second region; and reducing the substrate in the second region to a third thickness. The present invention also describes a mask comprising: an absorber layer, the absorber layer having a first opening and a second opening, the first opening uncovering a balancing layer disposed over a substrate having a first thickness, and the second opening uncovering the substrate having a second thickness.