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For the Inventor, By the Inventor

Kanagawa, Japan

Gerhard Beitel

This inventor holds 15 USPTO granted patents. Top assignees: Infineon Technologies Ag, Kabushiki Kaisha Toshiba, Siemens Aktiengesellschaft. Active years: 2001-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerhard Beitel. Retrieved from https://idiyas.com/inventor/gerhard-beitel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15

% Patents Active = 73.3

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 22(Granted Patents)


Location History:

  • München, DE (2001 - 2003)
  • Kamakura, JP (2003 - 2004)
  • Mühldorf/Inn, DE (2004)
  • Kanagawa, JP (2003 - 2006)
  • Munich, DE (2006)
  • Kanagawa-ken, JP (2006)

Company Filing History:

goldMedal12 out of 15,036 
 
Infineon Technologies Ag
 patents
silverMedal3 out of 53,276 
 
Kabushiki Kaisha Toshiba
 patents
bronzeMedal1 out of 30,886 
 
Siemens Aktiengesellschaft
 patents
4. 2 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 2001-2006

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15 patents (USPTO):Explore Patents
1. 7078309 - Methods for producing a structured metal layer (2006-07-18),
2. 7042705 - Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processing (2006-05-09),
3. 7031138 - Ferroelectric capacitor and process for its manufacture (2006-04-18),
4. 7009230 - Barrier stack with improved barrier properties (2006-03-07),
5. 6897501 - Avoiding shorting in capacitors (2005-05-24),
6. 6891713 - Element storage layer in integrated circuits (2005-05-10),
7. 6825116 - Method for removing structures (2004-11-30),
8. 6821187 - Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum group (2004-11-23),
9. 6787831 - Barrier stack with improved barrier properties (2004-09-07),
10. 6686265 - Method of producing a capacitor electrode with a barrier structure (2004-02-03),
11. 6621683 - Memory cells with improved reliability (2003-09-16),
12. 6614642 - Capacitor over plug structure (2003-09-02),
13. 6593228 - Method of fabricating a patterned metal-containing layer on a semiconductor wafer (2003-07-15),
14. 6552385 - DRAM memory capacitor having three-layer dielectric, and method for its production (2003-04-22),
15. 6190991 - Method for fabricating a capacitor (2001-02-20),

Title: Gerhard Beitel: Pioneering Inventor from Kanagawa

Introduction: Gerhard Beitel is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Gerhard Beitel holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his innovative spirit and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Gerhard Beitel has worked with leading research institutions and tech companies, playing a key role in developing cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Gerhard Beitel has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Gerhard Beitel's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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