IDiyas

For the Inventor, By the Inventor

Kanagawa, Japan

Gerhard Beitel

USPTO Granted Patents = 15

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 22(Granted Patents)


Location History:

  • München, DE (2001 - 2003)
  • Kamakura, JP (2003 - 2004)
  • Mühldorf/Inn, DE (2004)
  • Kanagawa, JP (2003 - 2006)
  • Munich, DE (2006)
  • Kanagawa-ken, JP (2006)

Company Filing History:

goldMedal12 out of 14,705 
 
Infineon Technologies Ag
 patents
silverMedal3 out of 52,711 
 
Kabushiki Kaisha Toshiba
 patents
bronzeMedal1 out of 30,028 
 
Siemens Aktiengesellschaft
 patents
4. 2 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 2001-2006

where 'Filed Patents' based on already Granted Patents

15 patents (USPTO):
1. 7078309 - Methods for producing a structured metal layer (2006-07-18),
2. 7042705 - Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processing (2006-05-09),
3. 7031138 - Ferroelectric capacitor and process for its manufacture (2006-04-18),
4. 7009230 - Barrier stack with improved barrier properties (2006-03-07),
5. 6897501 - Avoiding shorting in capacitors (2005-05-24),
6. 6891713 - Element storage layer in integrated circuits (2005-05-10),
7. 6825116 - Method for removing structures (2004-11-30),
8. 6821187 - Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum group (2004-11-23),
9. 6787831 - Barrier stack with improved barrier properties (2004-09-07),
10. 6686265 - Method of producing a capacitor electrode with a barrier structure (2004-02-03),
11. 6621683 - Memory cells with improved reliability (2003-09-16),
12. 6614642 - Capacitor over plug structure (2003-09-02),
13. 6593228 - Method of fabricating a patterned metal-containing layer on a semiconductor wafer (2003-07-15),
14. 6552385 - DRAM memory capacitor having three-layer dielectric, and method for its production (2003-04-22),
15. 6190991 - Method for fabricating a capacitor (2001-02-20),

Title: Gerhard Beitel: Pioneering Inventor from Kanagawa

Introduction: Gerhard Beitel is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Gerhard Beitel holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his innovative spirit and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Gerhard Beitel has worked with leading research institutions and tech companies, playing a key role in developing cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Gerhard Beitel has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Gerhard Beitel's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

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