Company Filing History:
Years Active: 1997-2004
Title: The Innovative Contributions of Gerald R Dietze
Introduction
Gerald R Dietze is a prominent inventor based in Portland, OR (US), known for his significant contributions to the field of semiconductor technology. With a total of 16 patents to his name, Dietze has made remarkable advancements that have influenced the manufacturing processes of semiconductor devices.
Latest Patents
Among his latest patents is the "In-situ post epitaxial treatment process," which outlines a method for forming an epitaxial layer on a semiconductor wafer substrate. This innovative process involves introducing a semiconductor wafer substrate into an epitaxial layer process chamber, where an epitaxial layer is formed on at least one surface. The process ensures that at least one epitaxial layer surface is substantially hydrophobic, followed by the introduction of a chemical reagent that reacts in situ to form an outer layer. Another notable patent is "Optimized silicon wafer gettering for advanced semiconductor devices." This method focuses on manufacturing a silicon wafer with robust gettering sites and a low concentration of surface defects. It includes steps such as adding polycrystalline silicon and a nitrogen-containing dopant to a crucible, heating the crucible to form a nitrogen-doped silicon melt, and pulling a silicon crystal from the melt using the Czochralski technique.
Career Highlights
Throughout his career, Gerald R Dietze has worked with various companies, including SEH America, Inc. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that enhance the performance and reliability of semiconductor devices.
Collaborations
Dietze has collaborated with notable professionals in the field, including Oleg V Kononchuk and Sean G Hanna. These collaborations have further enriched his work and contributed to the development of innovative solutions in semiconductor manufacturing.
Conclusion
Gerald R Dietze's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative processes continue to shape the future of semiconductor manufacturing.