The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Aug. 17, 1998
Gerald Roger Dietze, Portland, OR (US);
Dena Carol Anderson Mitchell, Portland, OR (US);
SEH America, Inc., Vancouver, WA (US);
Abstract
The exhaust insert is designed to reduce the eddy currents created within the reaction chamber so as to provide more even and predictable etching and/or epitaxial deposition. The exhaust insert is at least partially inserted into the exhaust port of the epitaxial barrel reactor. In particular, the exhaust insert includes an extension member that is adapted to be at least partially inserted within the exhaust port. The exhaust insert also includes an inlet member that extends beyond the exhaust port and into the barrel reactor. The inlet member is angled relative to the extension member so as to support the exhaust insert within the exhaust port of the barrel reactor. The angled design of the exhaust insert also serves to essentially scoop the exhaust gases into the exhaust port, thereby significantly reducing eddy current flow within the reaction chamber.