This inventor holds 1 USPTO granted patent. Top assignee: Seh America, Inc.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Dena Carol Anderson Mitchell: Innovator in Epitaxial Reactor Technology
Introduction
Dena Carol Anderson Mitchell is a notable inventor based in Portland, OR (US). She has made significant contributions to the field of epitaxial reactor technology. Her innovative work focuses on improving the efficiency and predictability of etching and deposition processes.
Latest Patents
Dena holds a patent for an "Exhaust insert for barrel-type epitaxial reactors." This invention is designed to reduce the eddy currents created within the reaction chamber, providing more even and predictable etching and/or epitaxial deposition. The exhaust insert is partially inserted into the exhaust port of the epitaxial barrel reactor. It features an extension member that is adapted to be at least partially inserted within the exhaust port. Additionally, the inlet member extends beyond the exhaust port and into the barrel reactor, angled relative to the extension member. This design supports the exhaust insert within the exhaust port and effectively scoops the exhaust gases into the exhaust port, significantly reducing eddy current flow within the reaction chamber. Dena has 1 patent to her name.
Career Highlights
Dena is currently employed at SEH America, Inc., where she continues to develop innovative solutions in her field. Her work has been instrumental in advancing the technology used in epitaxial reactors.
Collaborations
Dena collaborates with Gerald R Dietze, contributing to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Dena Carol Anderson Mitchell is a pioneering inventor whose work in epitaxial reactor technology has the potential to enhance manufacturing processes in the semiconductor industry. Her innovative patent reflects her commitment to advancing technology and improving efficiency in her field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
