Bridgewater, NJ, United States of America

Gary N Taylor


Average Co-Inventor Count = 1.9

ph-index = 12

Forward Citations = 398(Granted Patents)


Location History:

  • Fanwood, NJ (US) (1977 - 1980)
  • Bridgwater, NJ (US) (1996)
  • Bridgewater, NJ (US) (1983 - 1998)
  • Northborough, MA (US) (2005 - 2006)

Company Filing History:


Years Active: 1977-2006

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21 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Gary N. Taylor

Introduction: Gary N. Taylor, based in Bridgewater, NJ, is a prolific inventor recognized for his significant contributions to the field of microlithography through his innovative patents. With a remarkable inventory of 21 patents, he has consistently advanced the technology landscape, particularly in the development of materials that enhance lithographic processes.

Latest Patents: Among his latest innovations are two notable patents. The first, titled "Fluorinated Copolymers for Microlithography," focuses on developing photoresist compositions that utilize fluorinated copolymers. These materials are uniquely designed to maintain high ultraviolet (UV) transparency and developability in basic media, featuring a fluoroalcohol or protected fluoroalcohol functional group. This allows them to perform effectively at critical wavelengths of 193 and 157 nm, which are essential for modern lithography. The second patent, "Fluorinated Polymers Having Ester Groups and Photoresists for Microlithography," details another advancement in photoresist technology. This invention highlights the use of esters derived from fluoroalcohol functional groups that similarly facilitate high UV transparency and developability, making them ideal for short-wavelength lithography applications.

Career Highlights: Gary N. Taylor has a distinguished career, notably contributing his expertise to renowned organizations such as Bell Telephone Laboratories and E.I. du Pont de Nemours and Company. His tenure at these institutions has allowed him to work on cutting-edge technologies that have helped shape the future of photolithography.

Collaborations: Throughout his career, Gary has collaborated with esteemed colleagues, including Joseph M. Moran and Thirumalai N. Venkatesan. These partnerships have played a crucial role in advancing his research and the impact of his innovations in the field.

Conclusion: In conclusion, Gary N. Taylor's work exemplifies the spirit of innovation that drives advancements in technology. With a solid portfolio of patents and a history of collaboration and contribution, his legacy in microlithography continues to pave the way for future developments in this critical area of research.

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