The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1998
Filed:
May. 02, 1994
Edwin Arthur Chandross, Berkeley Heights, NJ (US);
Omkaram Nalamasu, Basking Ridge, NJ (US);
Elsa Reichmanis, Westfield, NJ (US);
Gary Newton Taylor, Bridgewater, NJ (US);
Larry Flack Thompson, Millington, NJ (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.