IDiyas

For the Inventor, By the Inventor

Bridgewater, NJ, United States of America

Omkaram Nalamasu

USPTO Granted Patents = 17

Average Co-Inventor Count = 4.0

ph-index = 9

Forward Citations = 290(Granted Patents)


Location History:

  • Basking Ridge, NJ (US) (1998 - 2000)
  • Bridgewater, NJ (US) (2001 - 2006)

Company Filing History:

goldMedal9 out of 9,364 
 
Lucent Technologies Inc.
 patents
silverMedal4 out of 2,316 
 
Agere Systems Inc.
 patents
bronzeMedal2 out of 598 
 
Agere Systems Guardian Corp.
 patents
4. 1 out of 65 
 
Triquint Technology Holding Co.
 patents
5. 2 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1998-2006

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17 patents (USPTO):Explore Patents
1. 7042645 - Micro-lens array and method of making micro-lens array (2006-05-09),
2. 6852648 - Semiconductor device having a low dielectric constant dielectric material and process for its manufacture (2005-02-08),
3. 6700708 - Micro-lens array and method of making micro-lens array (2004-03-02),
4. 6680150 - Suppression of side-lobe printing by shape engineering (2004-01-20),
5. 6537867 - High speed low voltage semiconductor devices and method of fabrication (2003-03-25),
6. 6392787 - Process for fabricating article comprising photonic band gap material (2002-05-21),
7. 6296984 - Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material (2001-10-02),
8. 6251546 - Method of fabricating devices using an attenuated phase-shifting mask and an attenuated phase-shifting mask (2001-06-26),
9. 6218057 - Lithographic process having sub-wavelength resolution (2001-04-17),
10. 6159665 - Processes using photosensitive materials including a nitro benzyl ester (2000-12-12),
11. 5998099 - Energy-sensitive resist material and a process for device fabrication (1999-12-07),
12. 5958654 - Lithographic process and energy-sensitive material for use therein (1999-09-28),
13. 5879857 - Energy-sensitive resist material and a process for device fabrication (1999-03-09),
14. 5843624 - Energy-sensitive resist material and a process for device fabrication (1998-12-01),
15. 5830619 - Resist materials (1998-11-03),

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