The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Aug. 25, 1997
Mary Ellen Galvin-Donoghue, Titusville, NJ (US);
Francis Michael Houlihan, Millington, NJ (US);
Janet Mihoko Kometani, Warren, NJ (US);
Omkaram Nalamasu, Basking Ridge, NJ (US);
Thomas Xavier Neenan, Boston, MA (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
A process for device fabrication is disclosed. In the process, an energy sensitive material is formed on a substrate. The energy sensitive resist material contains a polymer or a polymer blend in combination with an energy-sensitive material such as a photoacid generator. At least three substituents are distributed on the polymer blend. The first of these substituents is a hydroxyl (OH) group. The second of these substituents is an acid-sensitive or acid labile group which is cleaved in the presence of acid and replaced by an OH group. The third of these substituents forms hydrogen bonds with the first group. The ratio of the number of OH substituents relative to the number of substituents that hydrogen bond to the OH substituents (mole percent) is about 40:1 to at least about 1:1. The relative amounts of the first and third substituents is selected to provide a resist material with a glass transition temperature of at least about 60.degree.. After a layer of the energy sensitive resist material is formed on the substrate, an image of a pattern is introduced into the energy-sensitive material via a patternwise exposure to radiation. The image is thereafter developed into a pattern, and transferred into the underlying substrate.