Fumitomo Matsuoka

Title: **Fumitomo Matsuoka: Innovator in Semiconductor Technology**

Introduction

Fumitomo Matsuoka, a distinguished inventor based in Kawasaki, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 20 patents, Matsuoka is recognized for his cutting-edge innovations that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Matsuoka's latest inventions include two notable patents that showcase his ingenuity. The first patent describes a MOSFET gate insulating film and a method for manufacturing the same. This semiconductor device integrates an interface circuit operating on a high power supply voltage with an internal circuit that functions on a low power supply voltage, all within a single chip. The interface circuit features a transistor with a gate insulating film made of silicon oxide (SiO), while the internal circuit incorporates a transistor with an oxynitride film enriched with nitrogen in its gate insulating film. Additionally, the introduction of boron or BF into the gate electrodes of the p-channel transistors effectively enhances the device's operational capabilities.

The second patent focuses on a semiconductor device that employs a buried-type element isolation structure, along with a method of manufacturing it. This innovation features a silicon nitride film that remains on the side walls of an STI trench, allowing for the selective implantation of ions from the trench's bottom surface. This process creates a high-concentration punch-through suppression region, which has the same conductivity as the substrate or well, thus maintaining the integrity of the isolation structure. The design ultimately aims to prevent junction leaks between diffusion layers, facilitating the development of low capacitance well structures suitable for high-speed operational devices.

Career Highlights

Matsuoka's career has been marked by his association with Kabushiki Kaisha Toshiba, where he has been instrumental in advancing semiconductor technologies. His innovative mindset and technical expertise have led to the successful development and patenting of multiple semiconductor solutions that address contemporary industry challenges.

Collaborations

Throughout his career, Matsuoka has collaborated with renowned colleagues, including Kazunari Ishimaru and Minoru Takahashi. These partnerships have fostered a dynamic environment for innovation and have contributed to the successful realization of numerous semiconductor projects.

Conclusion

Fumitomo Matsuoka exemplifies the spirit of innovation within the semiconductor industry. Through his extensive patent portfolio and impactful collaborations, he continues to shape the future of semiconductor technology while enhancing performance and reliability. His work at Kabushiki Kaisha Toshiba ensures that he remains at the forefront of technological advancement, paving the way for future innovations.