Tokyo, Japan

Fumio Murai


Average Co-Inventor Count = 3.7

ph-index = 13

Forward Citations = 806(Granted Patents)


Location History:

  • Hachioji, JP (1982)
  • Nishitama, JP (1993)
  • Hinode-machi, JP (1996 - 2002)
  • Nishitama-gun, JP (2002 - 2003)
  • Hinode, JP (2003 - 2005)
  • Tokyo, JP (1983 - 2006)

Company Filing History:


Years Active: 1982-2006

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37 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Fumio Murai

Introduction

Fumio Murai, based in Tokyo, Japan, is a prolific inventor with an impressive portfolio of 37 patents. His work has significantly influenced the field of semiconductor manufacturing, particularly through advancements in photomask technology and electron beam projection processes.

Latest Patents

Among his latest contributions, Murai has developed multiple patents focused on enhancing semiconductor device manufacturing. One notable patent is a method involving a semitransparent phase shifting mask, which incorporates a light shielding portion designed to improve pattern accuracy. This innovation optimizes traditional photomask designs by strategically combining transparent and semitransparent areas for superior results.

Another significant patent from Murai addresses the challenges faced during fine processing in electron beam projection methodologies. His approach employs complementarily divided masks, allowing one mask to cater to high-dimensional accuracy while the other supports additional patterns. This segregation effectively lowers current application to critical areas, paving the way for high printing accuracy and improved throughput in the manufacturing process.

Career Highlights

Fumio Murai has made remarkable achievements throughout his career, having worked with prominent companies such as Hitachi, Ltd. and Showa Denko K.K. His experience in these organizations has enabled him to develop groundbreaking technologies that play a vital role in the semiconductor industry.

Collaborations

Throughout his professional journey, Murai has collaborated with notable colleagues, including Norio Hasegawa and Katsuya Hayano. These partnerships have fostered a creative environment, driving forward innovations that have advanced technology and manufacturing processes.

Conclusion

Fumio Murai's extensive contributions through his 37 patents exemplify his profound impact on the semiconductor field. His innovative approaches to photomask design and manufacturing processes continue to influence the industry, highlighting the importance of inventors and their work in driving technological advancement.

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