The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Feb. 27, 2003
Akemi Moniwa, Sayama, JP;
Jiro Yamamoto, Tachikawa, JP;
Fumio Murai, Hinode, JP;
Hiroshi Fukuda, Kodaira, JP;
Akemi Moniwa, Sayama, JP;
Jiro Yamamoto, Tachikawa, JP;
Fumio Murai, Hinode, JP;
Hiroshi Fukuda, Kodaira, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method is provided for solving a problem that the fine processing property is degraded by an increase of a current applied to complementarily divided masks in an electron beam projection process. In the method, the complementarily divided masks used for electron projection are used whereby one mask is used for patterns requiring high dimensional accuracy and another is used for other patterns. Consequently, it is possible to lower the current applied to the patterns requiring high dimensional accuracy to realize high printing accuracy. In addition, the highly accurate patterns can be formed at a high throughput.