Company Filing History:

7 out of 7,524

Renesas Electronics Corporation

Renesas Technology Corp.

patents

Years Active: 1997-2014

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13 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8835083 - Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device (2014-09-16),

2. 8563200 - Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device (2013-10-22),

3. 8426087 - Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method (2013-04-23),

4. 8367309 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask (2013-02-05),

5. 8119308 - Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask (2012-02-21),

6. 8071264 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask (2011-12-06),

7. 7935462 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask (2011-05-03),

8. 7682760 - Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask (2010-03-23),

9. 6964832 - Semiconductor device and manufacturing method thereof (2005-11-15),

10. 6787459 - Method for fabricating a semiconductor device (2004-09-07),

11. 6586341 - Method of manufacturing semiconductor device (2003-07-01),

12. 5895741 - Photomask, manufacture of photomask, formation of pattern, manufacture (1999-04-20),

13. 5700601 - Photomask, manufacture of photomask, formation of pattern, manufacture (1997-12-23),

Title: Akemi Moniwa: Innovator in Semiconductor Manufacturing

Introduction

Akemi Moniwa is a prominent inventor based in Tokyo, Japan, known for her significant contributions to the field of semiconductor manufacturing. With a total of 13 patents to her name, she has made remarkable advancements in technologies that enhance the efficiency and precision of semiconductor devices.

Latest Patents

Among her latest patents are innovative methods for manufacturing photomasks, optical proximity correction, and semiconductor devices. These patents detail a manufacturing method of a photomask that allows for the formation of a resist pattern corresponding to designed values. The methods involve extracting proximity design features that are close to each other and may violate mask rule checks. Correction prohibited regions are established based on the distance between features and the resolution of exposure devices. Optical proximity correction is then applied to the proximity design features, excluding the correction prohibited regions, to obtain corrected proximity patterns. This process culminates in the patterning of a predetermined mask material through electron beam lithography based on the corrected proximity pattern data.

Career Highlights

Akemi has worked with leading companies in the technology sector, including Renesas Electronics Corporation and Hitachi, Ltd. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout her career, Akemi has collaborated with notable colleagues such as Hiroshi Fukuda and Mitsuru Okuno.

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