The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Nov. 15, 2002
Applicant:
Inventors:
Akemi Moniwa, Sayama, JP;
Takuya Hagiwara, Tsukuba, JP;
Keitaro Katabuchi, Ome, JP;
Hiroshi Fukuda, Kodaira, JP;
Mineko Adachi, Kodaira, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01C 2/144 ; G06F 1/750 ; G03F 9/00 ;
U.S. Cl.
CPC ...
H01C 2/144 ; G06F 1/750 ; G03F 9/00 ;
Abstract
There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim mask. Phases are periodically assigned to shifter patterns within a given range from patterns generated with the phase shift mask, respectively.