Kodaira, Japan

Mineko Adachi

This inventor holds 1 USPTO granted patent. Top assignee: Renesas Technology Corp.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mineko Adachi. Retrieved from https://idiyas.com/inventor/mineko-adachi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Mineko Adachi: Innovator in Semiconductor Fabrication

Introduction

Mineko Adachi is a notable inventor based in Kodaira, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to advancements in the fabrication of semiconductor devices.

Latest Patents

Mineko Adachi holds a patent for a "Method for fabricating a semiconductor device." This method allows for the formation of fine patterns with high dimensional accuracy through multiple exposures, utilizing a phase shift mask and a trim mask. The technique involves periodically assigning phases to shifter patterns within a specified range from the patterns generated with the phase shift mask.

Career Highlights

Mineko Adachi is associated with Renesas Technology Corporation, where he applies his expertise in semiconductor fabrication. His work has been instrumental in enhancing the efficiency and precision of semiconductor devices.

Collaborations

Mineko has collaborated with talented individuals such as Akemi Moniwa and Takuya Hagiwara, contributing to the advancement of semiconductor technologies.

Conclusion

Mineko Adachi's innovative methods in semiconductor fabrication exemplify the importance of precision in technology development. His contributions continue to influence the semiconductor industry significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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