Company Filing History:
Years Active: 2004
Title: **Keitaro Katabuchi: Innovating Semiconductor Fabrication**
Introduction
Keitaro Katabuchi, an accomplished inventor based in Ome, Japan, has made significant contributions to the field of semiconductor technology. With a unique method for fabricating semiconductor devices, he has garnered attention for his innovative approach to pattern formation.
Latest Patents
Katabuchi holds a patent for a **Method for Fabricating a Semiconductor Device**. This invention provides a technique for forming fine patterns with high dimensional accuracy through multiple exposures. It utilizes a phase shift mask along with a trim mask, allowing for the periodic assignment of phases to shifter patterns within a specified range of those generated with the phase shift mask.
Career Highlights
Keitaro has built his career at **Renesas Technology Corporation**, where he works alongside talented colleagues, including Akemi Moniwa and Takuya Hagiwara. His work focuses on advancing semiconductor fabrication technologies, which are crucial to the development of modern electronic devices.
Collaborations
Throughout his career, Katabuchi has engaged in productive collaborations with his coworkers, including Akemi Moniwa and Takuya Hagiwara. Their teamwork has contributed to innovative solutions in the semiconductor industry, enriching the technological landscape.
Conclusion
Keitaro Katabuchi's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence. His patent highlights the potential for advancements in technology, impacting the future of electronic devices worldwide.