Shizuoka, Japan

Fumihiro Yoshino

USPTO Granted Patents = 13 

 

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Shizuoka, JP (2016 - 2021)
  • Haibara-gun, JP (2015 - 2024)

Company Filing History:


Years Active: 2015-2025

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13 patents (USPTO):Explore Patents

Title: Fumihiro Yoshino: Innovator in Radiation-Sensitive Resin Technology

Introduction

Fumihiro Yoshino is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 13 patents. His work has been instrumental in advancing technologies used in electronic devices and pattern formation.

Latest Patents

Yoshino's latest patents include a method for producing a radiation-sensitive resin composition and a pattern forming method. The first patent details a process that involves a stirring device with a stirring tank and a stirrer. This method includes a mixing step where a resin, an acid generator, and a solvent are combined, followed by a stirring step that ensures the mixture is properly blended. The specific ratio of the acid generator to the total mass of the mixture is crucial for the effectiveness of the composition.

The second patent focuses on an actinic ray-sensitive resin composition that is used for forming films with a thickness of 1 µm or more. This composition is designed to be exposed to actinic rays with wavelengths between 200 to 300 nm. The resulting film demonstrates a transmittance of 5% or more at a wavelength of 248 nm, allowing for the creation of patterns with excellent sensitivity and cross-sectional shapes.

Career Highlights

Fumihiro Yoshino is currently associated with Fujifilm Corporation, where he continues to innovate in the field of resin technology. His work has not only contributed to the company's portfolio but has also set new standards in the industry.

Collaborations

Throughout his career, Yoshino has collaborated with notable colleagues, including Michihiro Shirakawa and Hidenori Takahashi. These collaborations have further enhanced the impact of his inventions and have fostered a culture of innovation within his team.

Conclusion

Fumihiro Yoshino's contributions to radiation-sensitive resin technology have established him as a key figure in the field. His innovative patents and collaborations continue to influence advancements in electronic device manufacturing.

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