The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Jan. 24, 2023
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Fumihiro Yoshino, Haibara-gun, JP;
Takamitsu Tomiga, Haibara-gun, JP;
Yuma Kurumisawa, Haibara-gun, JP;
Takumi Tanaka, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 212/24 (2020.02); C08F 220/1804 (2020.02); C08F 220/1806 (2020.02); G03F 7/038 (2013.01);
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) and a resin (B) which include a repeating unit having an acid-decomposable group, and the acid-decomposable group in the resin (A) and the acid-decomposable group in the resin (B) have the same structures. Regarding the resin (A) and the resin (B), |G−G| is from 5% by mole to 20% by mole, S/Sis 10/90 to 90/10, |Mw−Mw| is from 100 to 5,000, and |Mw/Mn−Mw/Mn| is 0.05 or more.