The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9519214 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 13, 2016

Filed:

Aug. 05, 2015
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Fumihiro Yoshino, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/0758 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01);
Abstract

An actinic-ray- or radiation-sensitive resin composition includes a compound (A) that is configured to produce an acid when exposed to actinic rays or radiation, and a resin (B). The compound (A) is expressed by general formula (1) or (2) below. The resin (B) contains a repeating unit (b) containing a group that is configured to decompose when acted on by an acid to thereby produce an alcoholic hydroxyl group.


Find Patent Forward Citations

Yoshino, Fumihiro. (2016). Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device (U.S. Patent No. 9519214). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9519214

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