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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9551931 B1

PDFFull Text
Date of Patent:
Jan. 24, 2017

Filed:

Sep. 14, 2015

Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Junichi Ito, Shizuoka, JP;

Akinori Shibuya, Shizuoka, JP;

Akiyoshi Goto, Shizuoka, JP;

Michihiro Shirakawa, Shizuoka, JP;

Kei Yamamoto, Shizuoka, JP;

Fumihiro Yoshino, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08F 220/36 (2006.01); H01L 21/027 (2006.01); C08F 220/18 (2006.01); C07C 381/12 (2006.01); C08F 220/30 (2006.01); G03F 7/20 (2006.01); C08F 220/14 (2006.01); C08F 220/28 (2006.01); C08F 220/26 (2006.01); C08F 232/08 (2006.01); G03F 7/32 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07C 381/12 (2013.01); C08F 220/14 (2013.01); C08F 220/18 (2013.01); C08F 220/26 (2013.01); C08F 220/28 (2013.01); C08F 220/30 (2013.01); C08F 220/36 (2013.01); C08F 232/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); H01L 21/0274 (2013.01);
Abstract

A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.

Find Patent Forward Citations

Ito, Junichi. (2017). Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device (U.S. Patent No. 9551931). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9551931

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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