The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Sep. 24, 2013
Fujifilm Corporation, Tokyo, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Shoichi Saitoh, Shizuoka, JP;
Fumihiro Yoshino, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.