The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Sep. 02, 2022
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Takamitsu Tomiga, Haibara-gun, JP;
Kohei Higashi, Haibara-gun, JP;
Fumihiro Yoshino, Haibara-gun, JP;
Yuma Kurumisawa, Haibara-gun, JP;
Takumi Tanaka, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/0048 (2013.01);
Abstract
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising: preparing an intermediate solution which includes a photoacid generator and a solvent; and mixing the intermediate solution with at least a resin to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.