Toyama, Japan

Fumihiko Noro


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 58(Granted Patents)


Location History:

  • Kyotanabe, JP (2001 - 2005)
  • Kyoto, JP (2003 - 2006)
  • Toyama, JP (2008 - 2011)

Company Filing History:


Years Active: 2001-2011

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20 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Fumihiko Noro in Semiconductor Technology**

Introduction

Fumihiko Noro is a prominent inventor based in Toyama, Japan, known for his significant contributions to semiconductor technology. With a remarkable portfolio of 20 patents, Noro has played a pivotal role in advancing methods for fabricating semiconductor devices. His visionary ideas have not only augmented the field but also impacted various industries that rely on semiconductor functionality.

Latest Patents

Noro's latest patents showcase his ingenuity in semiconductor fabrication methods. One notable patent describes a method for fabricating a semiconductor device that involves forming a trapping film on a semiconductor region to store information by accumulating charges. This innovative approach includes the implantation of impurity ions to create diffused layers, the inclusion of an insulating film, and a thermal process to oxidize the upper portions of the diffused layers. The outcome is a sophisticated structure that enhances the performance of semiconductor devices.

Another significant patent outlines the method of forming a semiconductor device that incorporates a trapping film for charge accumulation. In this design, source and drain regions are formed in the substrate, with the trapping film positioned strategically to improve information storage capabilities, complemented by gate electrodes on the trapping film.

Career Highlights

Throughout his career, Fumihiko Noro has worked with renowned companies, including Matsushita Electric Industrial Co., Ltd. and Panasonic Corporation. His experiences in these organizations have allowed him to collaborate on cutting-edge technology, driving innovation and offering valuable solutions in the semiconductor domain.

Collaborations

Noro has had the opportunity to work alongside notable colleagues such as Nobuyoshi Takahashi and Seiki Ogura. These collaborations have not only fostered a rich exchange of ideas but have also led to the development of groundbreaking technologies that continue to influence the semiconductor industry.

Conclusion

Fumihiko Noro's contributions to semiconductor technology through his innovative patents and collaborations exemplify the spirit of innovation in this field. His work has left a lasting impact on the industry, shaping the future of semiconductor devices and solidifying his reputation as a leading inventor. As technology continues to evolve, Noro's legacy will undoubtedly inspire future advancements in innovation and invention.

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